Column simultaneously focusing a particle beam and an...

Details Column simultaneously focusing a particle beam and an... Column simultaneously focusing a particle beam and an...

2007-10-31

2009-08-11

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S3960ML, C250S42300F

Reexamination Certificate

active

07573050

ABSTRACT:
Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.

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patent: 2007/0293052 (2007-12-01), Le Roy et al.
patent: 2008/0185509 (2008-08-01), Knowles

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