Collimated x-ray source for x-ray lithographic system

Details Collimated x-ray source for x-ray lithographic system Collimated x-ray source for x-ray lithographic system

1974-10-23

1976-03-30

Borchelt, Archie R.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250505, G01N 2134

Patent

active

039476871

ABSTRACT:
In an X-ray lithographic system, high power X-ray illumination of photo-resist coated substrate members is accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.

REFERENCES:
patent: 3447924 (1969-06-01), Trzyne et al.
patent: 3742229 (1973-06-01), Smith et al.
patent: 3742230 (1973-06-01), Spears et al.
patent: 3743842 (1973-07-01), Smith et al.
patent: 3867637 (1975-02-01), Braun et al.

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