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Vapor etching of nuclear tracks in dielectric materials

Etching a substrate: processes – Etching to produce porous or perforated article
Patent

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Vapor HF etch process mask and method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Reexamination Certificate

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Vapor HF etch process mask and method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Reexamination Certificate

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Vapor selective etching method and apparatus

Etching a substrate: processes – Gas phase etching of substrate – Etching vapor produced by evaporation – boiling – or sublimation
Patent

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Vapor-phase processing method and apparatus therefor

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Variable gap magnetoresistive transducer and method of making th

Etching a substrate: processes – Forming or treating article containing magnetically...
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Variable time etching system according to the accumulated...

Etching a substrate: processes – Nongaseous phase etching of substrate – Recycling – regenerating – or rejunevating etchant
Reexamination Certificate

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VD process and apparatus for producing stand-alone thin films

Etching a substrate: processes – Gas phase etching of substrate – Etching a multiple layered substrate where the etching...
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Vertical integration of a MEMS structure with electronics in...

Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate

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Video rate-enabling probes for atomic force microscopy

Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate

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Wafer bevel polymer removal

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Wafer carrier assembly for a chemical mechanical polishing...

Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
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Wafer conductive structure for preventing plasma damage

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Wafer etching method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Wafer flattening process and system

Etching a substrate: processes – Planarizing a nonplanar surface
Reexamination Certificate

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Wafer processing apparatus, wafer processing method, and SOI...

Etching a substrate: processes – Nongaseous phase etching of substrate – Relative movement between the substrate and a confined pool...
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Wafer processing method and equipment therefor

Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Patent

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Wafer processing using thermal nitride etch mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
Patent

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Wafer stack and method of producing sensors

Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent

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Wafer stage including electrostatic chuck and method for...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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