Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2007-07-24
2007-07-24
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
Reexamination Certificate
active
10771135
ABSTRACT:
A wafer-scale fabrication method for providing MEMS assemblies having a MEMS subassembly sandwiched between and bonded to a cap and a base is provided. The MEMS subassembly includes at least one MEMS device element flexibly connected to the MEMS assembly. The vertical separation between the MEMS device element and an electrode on the base is lithographically defined. Precise control of this critical vertical gap dimension is thereby provided. Fabrication cost is greatly reduced by wafer scale integration.
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Flannery, Jr. Anthony Francis
Nasiri Steven S.
Atmel Corporation
Culbert Roberts
Hassanzadeh Parviz
Sawyer Law Group LLP
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