Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2008-01-30
2011-11-22
Culbert, Roberts (Department: 1716)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S079000, C216S099000
Reexamination Certificate
active
08062535
ABSTRACT:
Method for producing a probe for atomic force microscopy with a silicon nitride cantilever and an integrated single crystal silicon tetrahedral tip with high resonant frequencies and low spring constants intended for high speed AFM imaging.
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Burger et al., “High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through,” The 8thInternational Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Stockholm, Sweden, Jun. 25-29, 1995, pp. 573-576.
Culbert Roberts
The Marbury Law Group PLLC
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