Video rate-enabling probes for atomic force microscopy

Etching a substrate: processes – Forming or treating an article whose final configuration has...

Reexamination Certificate

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C216S079000, C216S099000

Reexamination Certificate

active

08062535

ABSTRACT:
Method for producing a probe for atomic force microscopy with a silicon nitride cantilever and an integrated single crystal silicon tetrahedral tip with high resonant frequencies and low spring constants intended for high speed AFM imaging.

REFERENCES:
patent: 5021364 (1991-06-01), Akamine et al.
patent: 5264696 (1993-11-01), Toda
patent: 6198300 (2001-03-01), Doezema et al.
patent: 6274198 (2001-08-01), Dautartas
Burger et al., “High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through,” The 8thInternational Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Stockholm, Sweden, Jun. 25-29, 1995, pp. 573-576.

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