Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1998-01-12
2000-08-22
Acquah, Samuel A.
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 13, 216 17, 216 39, 257417, 257419, 257684, 257727, H01L 21306
Patent
active
061067350
ABSTRACT:
A wafer stack with sensor elements hermetically sealed in caverns and a method of fabricating the sensors permitting a reduction in the size of the sensors formed after cutting the wafer stack and also yielding considerable savings in chip area in the manufacture of the wafer stack. The wafer stack includes bonding strips arranged between the individual sensor elements. The wafer stack is diced to form individual sensors by sawing in the middle through the bonding strips.
REFERENCES:
patent: 5323051 (1994-06-01), Adams et al.
patent: 5421956 (1995-06-01), Koga et al.
patent: 5528214 (1996-06-01), Koga et al.
Baumann Helmut
Bender Karl
Kurle Jurgen
Lutz Markus
Muenzel Horst
Acquah Samuel A.
Robert & Bosch GmbH
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