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Halogen-free amorphous carbon mask etch having high...

Etching a substrate: processes – Forming pattern using lift off technique
Reexamination Certificate

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Hard mask integrated etch process for patterning of silicon...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
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Hard masking method for forming oxygen containing plasma etchabl

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
Patent

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Hard masking method for forming patterned oxygen containing plas

Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent

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Hard masking method for forming patterned oxygen containing...

Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reissue Patent

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Head member, method for ink-repellent treatment and...

Etching a substrate: processes – Forming or treating thermal ink jet article
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Head slider with projecting arranged on rails thereof

Etching a substrate: processes – Forming or treating article containing magnetically...
Patent

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Heat treatment jig for semiconductor wafers and a method for tre

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
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Heat-transfer-stamp process for thermal imprint lithography

Etching a substrate: processes – Etching of semiconductor material to produce an article...
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Heater for use in electrophotographic image fixing device

Etching a substrate: processes – Adhesive or autogenous bonding of two or more... – Removing at least one of the self-sustaining preforms or a...
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Heating element

Etching a substrate: processes – Forming or treating thermal ink jet article
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Hermetic low dielectric constant layer for barrier applications

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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HF vapor phase wafer cleaning and oxide etching

Etching a substrate: processes – Gas phase etching of substrate – Etching vapor produced by evaporation – boiling – or sublimation
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High aspect ratio contacts

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High aspect ratio etch using modulation of RF powers of...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High density plasma chemical vapor deposition process

Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
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High density plasma chemical vapor deposition process

Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
Patent

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High etch rate residue free metal etch process with low frequenc

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High frequency plasma process wherein the plasma is executed by

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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High precision alignment of optical waveguide features

Etching a substrate: processes – Forming or treating optical article
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