Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2005-09-27
2005-09-27
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S009000, C216S022000, C216S041000, C216S049000, C216S052000, C264S320000, C977S726000
Reexamination Certificate
active
06949199
ABSTRACT:
A method of performing thermal imprint lithography of a surface of a thermoplastic layer-coated workpiece for forming a pattern therein comprises pre-heating the workpiece to a pre-selected high temperature prior to inserting the workpiece in a stamping/imprinting tool maintained at a predetermined lower temperature, whereby the interval for thermal cycling of the stamping/imprinting tool between higher and lower temperatures is eliminated or at least reduced. Applications of the method include forming servo patterns in disk-shaped substrates for hard disk recording media.
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Gauzner Gennady
Kuo David Shiao-Min
Wago Koichi
Alanko Anita
McDermott Will & Emery LLP
Seagate Technology LLC
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