LandOfFree - US Patents - Listing for Etching a substrate: processes,Masking of a substrate using material resistant to an etchant,Mask resist contains inorganic material

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Etching of hard masks

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Hard mask integrated etch process for patterning of silicon...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Metal mask etching of silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method for forming fine grooves and stamper and structure...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method for manufacturing a semiconductor device with ultra-fine

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method of dry etching with hydrogen bromide or bromide

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method of making a high-definition printed circuit

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method to produce masking

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Methods for anisotropic etching of (100) silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Process for defining a pattern using an anti-reflective coating

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Semiconductor processing

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Wafer processing using thermal nitride etch mask