Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
Patent
1994-05-04
1995-11-21
Powell, William
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Mask resist contains inorganic material
216 48, 216 52, 216105, B44C 122, C23F 102
Patent
active
054683459
ABSTRACT:
A method of making printed circuit boards in a continuous process. The method uses copper base metal sputtered onto a substrate. This base metal is much thinner than the base metal normally used in printed circuit processes and ultimately allows a greater number of conductors per unit of length to be made on the boards.
REFERENCES:
patent: 4444619 (1984-04-01), O'Hara
patent: 5242540 (1993-09-01), Ishii et al.
Kirby Ronald K.
Watson James W.
Dunn Aubrey J.
Powell William
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