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Active neural network control of wafer attributes in a plasma et

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Active neural network determination of endpoint in a plasma etch

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Apparatus and method for controlling the voltage applied to...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Apparatus and method for detecting end point of post treatment

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Apparatus and method for monitoring processing of a substrate

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Apparatus and method for radio frequency de-coupling and...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Cleaning of multicompositional etchant residues

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Confinement ring drive

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Control of etch selectivity

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Control of ion angular distribution function at wafer surface

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Control of semiconductor processing

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Controlled method for segmented electrode apparatus and...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Controlling plasma processing using parameters derived...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Critical dimension control in a semiconductor fabrication...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Detection method of coating film thickness and ion...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Determining endpoint in etching processes using principal...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Disturbance-free, recipe-controlled plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Dry etching method

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Dry etching system and dry etching method using plasma

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Dry-etching process simulator

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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