Active neural network control of wafer attributes in a plasma et
Active neural network determination of endpoint in a plasma etch
Apparatus and method for controlling the voltage applied to...
Apparatus and method for detecting end point of post treatment
Apparatus and method for monitoring processing of a substrate
Apparatus and method for radio frequency de-coupling and...
Cleaning of multicompositional etchant residues
Confinement ring drive
Control of etch selectivity
Control of ion angular distribution function at wafer surface
Control of semiconductor processing
Controlled method for segmented electrode apparatus and...
Controlling plasma processing using parameters derived...
Critical dimension control in a semiconductor fabrication...
Detection method of coating film thickness and ion...
Determining endpoint in etching processes using principal...
Disturbance-free, recipe-controlled plasma processing method
Dry etching method
Dry etching system and dry etching method using plasma
Dry-etching process simulator