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Technique for depositing coatings by pyrolysis/decomposition of

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Temperature controlled distributor beam for chemical vapor depos

Coating apparatus – Gas or vapor deposition – Running length work
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Thin film forming device

Coating apparatus – Gas or vapor deposition – Running length work
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Three-dimensional micro fabrication device for filamentary subst

Coating apparatus – Gas or vapor deposition – Running length work
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Unwinding of plastic film in the presence of a plasma

Coating apparatus – Gas or vapor deposition – Running length work
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Upstream cathode assembly

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum coating installation

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum coating vessel with movable shutter plate

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum deposition apparatus

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum evaporating apparatus utilizing multiple rotatable cans

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum evaporation coating equipment

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum evaporation system for deposition of thin films

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum vapor deposition apparatus

Coating apparatus – Gas or vapor deposition – Running length work
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Vacuum vapor deposition system

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Vapor deposition apparatus

Coating apparatus – Gas or vapor deposition – Running length work
Reexamination Certificate

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Vapor deposition apparatus

Coating apparatus – Gas or vapor deposition – Running length work
Reexamination Certificate

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Variable environment, scale-able, roll to roll system and...

Coating apparatus – Gas or vapor deposition – Running length work
Reexamination Certificate

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Vertical semiconductor processor

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Vertical two chamber reaction furnace

Coating apparatus – Gas or vapor deposition – Running length work
Patent

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Wafer processing reactor having a gas flow control system and me

Coating apparatus – Gas or vapor deposition – Running length work
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