Vacuum deposition apparatus

Details Vacuum deposition apparatus Vacuum deposition apparatus

1999-04-09

2000-10-17

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Running length work

118723R, 20429803, C23C 1600

Patent

active

061325163

ABSTRACT:
Disclosed herein is a vacuum deposition apparatus including a vacuum chamber having an opening, a substrate to form a thin film thereon provided in the vacuum chamber, an evacuating device connected to the vacuum chamber for evacuating the vacuum chamber, a moving unit provided movably relative to the opening of the vacuum chamber, the moving unit having a cover for openably closing the opening of the vacuum chamber and a supporting member projecting from the cover, a reactor unit removably mounted on the supporting member of the moving unit for forming a thin film on the substrate in the condition where the reactor unit is moved into the vacuum chamber by the moving unit, and a positioning device provided in the vacuum chamber and having a retainer for separating the reactor unit from the supporting member of the moving unit and for retaining the rector unit with a given gap defined between the reactor unit and the substrate. With this configuration, a thin film can be accurately formed on the substrate, and the maintenance of the reactor unit can be easily carried out.

REFERENCES:
patent: 5948166 (1999-09-01), David et al.

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