Vertical semiconductor processor

Details Vertical semiconductor processor Vertical semiconductor processor

1985-04-01

1986-07-22

Pianalto, Bernard D.

Coating apparatus

Gas or vapor deposition

Running length work

118 501, 118719, 427 39, C23C 1600

Patent

active

046012605

ABSTRACT:
A vertical processor for the continuous deposition of semiconductor alloy material by glow discharge techniques. The vertical processor includes a plurality of operatively interconnected deposition chambers, at least one chamber of which includes a generally vertical cathode plate about each of the opposed faces of which a plasma region is developed and a substrate continuously passes for the deposition of semiconductor alloy material thereonto. Through the utilization of the vertical deposition scenario, the length of the processor may be substantially foreshortened, power consumption may be substantially decreased and feedstock gases may be more efficiently utilized.

REFERENCES:
patent: 4513684 (1985-04-01), Nath
patent: 4519339 (1985-05-01), Izu et al.

Affiliated with

Also associated with

Rating

Vertical semiconductor processor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vertical semiconductor processor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vertical semiconductor processor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-860259