Vacuum evaporation system for deposition of thin films

Details Vacuum evaporation system for deposition of thin films Vacuum evaporation system for deposition of thin films

1981-09-03

1983-04-19

Smith, John D.

Coating apparatus

Gas or vapor deposition

Running length work

118715, 118730, 55385R, 204298, C23C 1310

Patent

active

043802117

ABSTRACT:
A blower and a dust collector are communicated through valves with an evacuated process chamber in which are disposed one or more sets of a film-substrate holder and an evaporation source in such a way that the blower, the dust collector and the process chamber constitute a closed circuit.

REFERENCES:
patent: 2332309 (1943-10-01), Drummond
patent: 3368523 (1968-02-01), Becker
patent: 4205623 (1980-06-01), Mahl
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4228004 (1980-10-01), Foster
Chern, "Improved Design for CVD Reactor", Insulation/Circuits, vol. 26, No. 12, Nov. 1980, pp. 62-63.

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