LandOfFree - US Patents - Listing for Chemistry: electrical and wave energy,Processes and products,Coating, forming or etching by sputtering

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering target for forming high-resistance transparent...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering target producing few particles, backing plate or...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering target protection device

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering target, method of producing the target, optical...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering target, transparent conductive film, and method...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering using a plasma-shaping magnet ring

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Sputtering with collinator cleaning within the sputtering chambe

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Stable high rate reactive sputtering

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Staged aluminum deposition process for filling vias

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Staged aluminum deposition process for filling vias

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Staggered target tiles

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Stamper forming method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Stationary aperture plate for reactive sputter deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Step coverage and overhang improvement by pedestal bias voltage

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Step coverage and overhang improvement by pedestal bias...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Storage plate support for receiving disk-shaped storage plates

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Stress tunable tantalum and tantalum nitride films

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Substrate coated with an MgO layer

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Substrate coated with an MGO-layer