Sputtering target protection device

Details Sputtering target protection device Sputtering target protection device

1997-05-14

1998-12-08

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429801, 20429802, 20429812, C23C 1434

Patent

active

058463895

ABSTRACT:
A sputtering target protection device for covering and protecting the precisely machined and engineered surface of a sputtering target assembly during shipment, intermediate handling and installation of the target assembly. The protection device includes a top wall preferably having the same general circumferential configuration as the top surface of the target, and an integral skirt which depends from the top wall. The depending skirt is adapted to frictionally engage a side surface of the sputtering target while the top wall of the protection device is spaced from the sputtering surface to cover and protect the surface during shipment and installation of the target assembly. The protection device is designed to be single-use and disposable. Methods are also disclosed.

REFERENCES:
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 5130005 (1992-07-01), Hurwitt et al.
patent: 5232091 (1993-08-01), Hennessy et al.
patent: 5284561 (1994-02-01), Shinneman et al.
patent: 5336386 (1994-08-01), Marx et al.
patent: 5474667 (1995-12-01), Hurwitt et al.
patent: 5529673 (1996-06-01), Strauss et al.

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