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Planar optical devices and methods for their manufacture

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Planar optical devices and methods for their manufacture

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Planarization method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Planetary substrate carrier method and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma & reactive ion etching to prepare ohmic contacts

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma density modulator for improved plasma density...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma etch reactor and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma forming electrode and method of using the same

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma noise and arcing suppressor apparatus and method for sput

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma processing apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma processing apparatus and the method of the same

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma processing method and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma processing method and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma processing method and plasma processing apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma processing system utilizing combined anode/ ion source

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma sputter etching system with reduced particle contaminatio

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma treating method and apparatus therefor

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma treating method and apparatus therefor

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma treating method and apparatus therefor

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Plasma vapor deposition with coil sputtering

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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