Plasma processing apparatus and the method of the same

Details Plasma processing apparatus and the method of the same Plasma processing apparatus and the method of the same

1991-09-23

1993-05-18

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429831, 20429833, 20429834, 20429837, 20429838, 156345, 156643, 118723, 134 1, B01J 1912, C23F 404

Patent

active

052118258

ABSTRACT:
A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes:

REFERENCES:
patent: 4576698 (1986-03-01), Gallagher et al.
patent: 4657616 (1987-04-01), Benzing et al.
patent: 4816113 (1989-03-01), Yamazaki
patent: 4960488 (1990-10-01), Law et al.
patent: 4975144 (1990-12-01), Yamazaki et al.
patent: 4989540 (1991-02-01), Fuse et al.
patent: 5024748 (1991-06-01), Fujimura
patent: 5084125 (1992-01-01), Aoi

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