Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

1989-02-03

1990-11-20

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419235, 20429834, 118723, 156345, 156643, 427 38, 427 39, 42218605, C23F 404, C23C 1444

Patent

active

049716670

ABSTRACT:
A plasma process and an apparatus therefor are described. A number of substrates are disposed between a pair of electrodes, to which a high frequency electromagnetic power is applied in order to generate glow discharge and induce a plasma. The substrates in the plasma are additionally applied with an alternating electric field. By virtue of the alternating electric field, the substrates are subjected to sputtering action.

REFERENCES:
patent: 4464223 (1984-08-01), Gorin
patent: 4572759 (1986-02-01), Benzing
patent: 4581100 (1986-04-01), Hatzakis et al.
patent: 4582720 (1986-04-01), Yamazaki
patent: 4585516 (1986-04-01), Corn et al.
patent: 4723508 (1988-02-01), Yamazaki et al.
patent: 4808553 (1989-02-01), Yamazaki
patent: 4844775 (1989-07-01), Keeble

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