Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-02-06
1988-12-13
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
204298, 118500, 1983461, 414217, C23C 1434
Patent
active
047909218
ABSTRACT:
An inexpensive, vertically oriented multiple substrate carrier is disclosed for high-temperature, high vacuum film deposition systems. In one embodiment, the substrates have central circular openings and the carrier includes a plurality of supports on which the substrates hang, with each support, such as a vertically oriented sheave, engaging the perimeter of a substrate opening. As the carrier is rotated, planetary motion is imparted to the substrates to facilitate simultaneous, two-sided, substantially uniform deposition of a film. In another embodiment, the substrates are circular and are each supported for planetary motion and two sided deposition in a respective circular groove which bounds an opening through the carrier.
REFERENCES:
patent: 3677924 (1972-07-01), Cash, Jr. et al.
patent: 4025410 (1977-05-01), Stewart
patent: 4274936 (1981-06-01), Love
patent: 4410407 (1983-10-01), Macaulay
patent: 4473455 (1984-09-01), Dean et al.
patent: 4485911 (1984-12-01), Cameron
patent: 4498833 (1985-02-01), Hertel
patent: 4500407 (1985-02-01), Boys et al.
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4558388 (1985-12-01), Graves, Jr.
patent: 4595481 (1986-06-01), Allen et al.
patent: 4650064 (1987-03-01), Slabaugh
Torr Vac Model 4000 Vertical, In-Line Sputtered Deposition System, Specification #1051 4/84.
Bloomquist Darrel R.
Drennan George A.
Opfer James E.
Hewlett--Packard Company
Murray Leslie G.
Nguyen Nam X.
Niebling John F.
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