(111) Group II-VI epitaxial layer grown on (111) silicon substra

(RIE) Plasma process for making metal-semiconductor ohmic type c

8-beam bridge-type silicon acceleration sensor and the fabricati

Acoustically regulated polishing process

Acousto-optic frequency shifter using optical fiber and method o

Active magnetic flow control in Czochralski systems

Active matrix display screen with transistor sources connected t

Active matrix display screen without spurious transistor

Addition of silicon tetrabromide to halogenated plasmas as a tec

Additive processing electroless metal plating using aqueous phot

Additives process for producing plated holes in printed circuit

Adhesion bond-breaking of lift-off regions on semiconductor stru

Adhesion promoter for additively plated printed circuit boards

Adhesive bonding of poly(arylene sulfide) surfaces

Adjustable heat shield assembly

Advanced vacuum processor

Advantageous fabrication technique for devices relying on magnet

After etch test method and apparatus

Alignment and assembly method

Alkaline stripping compositions