Semiconductor device structure with hydrogen-rich layer for...
Semiconductor device using low-k material as interlayer...
Semiconductor device with a graded passivation layer
Semiconductor device with a passivation film
Semiconductor device with a tungsten contact
Semiconductor device with etch stopping film
Semiconductor device with film covering
Semiconductor device with improved insulating/passivating layer
Semiconductor device with improved planarity achieved...
Semiconductor device with improved reliability and...
Semiconductor device with interlayer film comprising a...
Semiconductor device with interlayer insulating film covering th
Semiconductor device with metal peripheral area
Semiconductor device with metal silicide film on partial...
Semiconductor device with multi-layer interlayer dielectric...
Semiconductor device with multi-level structured insulator and f
Semiconductor device with passivation layer of benzocyclobutene
Semiconductor device with reduced aspect ratio contact hole
Semiconductor device with reduced leakage current
Semiconductor device with silicon oxynitride gate insulating...