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Plasma implantation of impurities in junction region recesses

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Plasma in-situ treatment of chemically amplified resist

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma induced depletion of fluorine from surfaces of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Plasma method and apparatus for processing a substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma method and apparatus for processing a substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma method for fabricating oxide thin films

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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Plasma monitoring method and semiconductor production apparatus

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Electrical characteristic sensed
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Plasma nitridation for reduced leakage gate dielectric layers

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma nitridation for reduced leakage gate dielectric layers

Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
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Plasma nitriding method, method for manufacturing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma oxidation method and method for manufacturing...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Plasma oxidation processing method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma oxidizing method, plasma processing apparatus, and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma oxidizing method, storage medium, and plasma...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma polishing method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma polymerized electron beam resist

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma preclean with argon, helium, and hydrogen gases

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma pretreatment of photoresist in an oxide etch process

Semiconductor device manufacturing: process – Chemical etching
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Plasma process apparatus and plasma process method for...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma process enhancement through reduction of gaseous...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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