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Method of scaling dielectric thickness in a semiconductor proces

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Method to eliminate re-crystallization border defects...

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Method to fabricate surface p-channel CMOS

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Method to form polysilicon resistors shielded from hydrogen intr

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Method to improve resistance uniformity and repeatability...

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Method to increase substrate potential in MOS transistors...

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Method to inhibit the formation of ion implantation induced edge

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Method to reduce source-line resistance in flash memory with...

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Method using multiple layer annealing cap for fabricating...

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Methodology for control of short channel effects in MOS...

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Methods and a device for heat treating a semiconductor wafer...

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Methods and apparatus for improved mosfet drain extension...

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Methods and apparatus for plasma doping and ion implantation...

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Methods for fabricating nanocoils

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Methods for forming nitrogen-rich regions in a floating gate and

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Methods for forming nitrogen-rich regions in non-volatile...

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Methods for forming shallow junctions in semiconductor wafers

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Methods for stable and repeatable ion implantation

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Methods of changing threshold voltages of semiconductor...

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Methods of controlling VSS implants on memory devices, and...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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