Methods for fabricating nanocoils

Details Methods for fabricating nanocoils Methods for fabricating nanocoils

2006-09-21

2009-10-13

Purvis, Sue (Department: 2826)

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

Ion implantation of dopant into semiconductor region

C438S479000, C216S002000, C257SE21320

Reexamination Certificate

active

07601620

ABSTRACT:
Improved nanocoils, systems and methods for fabricating nanocoils. Embodiments enable wet etching techniques for releasing coiling arm structures and forming nanocoils. A method for fabricating nanocoils includes providing a silicon-on-insulator (SOI) wafer in which SOI wafer includes a buried oxide layer, patterning one or more devices onto a silicon device layer on top of the buried oxide layer, depositing a tensile stressed layer on the silicon device layer so that stressed layer and silicon device layer form a stressed coiling bi-layer, patterning a coiling arm structure on the stressed coiling bi-layer, depositing a metal encapsulation layer on the stressed coiling bi-layer, and releasing the coiling arm structure so that coiling arm coils to form nanocoil. A system for fabricating nanocoils includes a substrate, a coiling arm structure including, a buried oxide layer deposited on the substrate, a stressed coiling bi-layer attached to the buried oxide layer including a silicon device layer that includes one or more devices defined thereon and a stressed nitride layer that provides a tensile coiling stress, and a metal encapsulation layer that protects stressed nitride layer from hydrofluoric (HF) acid used to release the coiling arm structure from the substrate during the wet etch technique so that coiling arm structure coils into nanocoil when released. Improved nanocoils may be fabricated according to these and other methods and systems.

REFERENCES:
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patent: 6498557 (2002-12-01), Johnson
patent: 2003/0168707 (2003-09-01), Sakamoto et al.
patent: 2005/0013151 (2005-01-01), Nathanson et al.
International Search Report issued May 15, 2007 in counterpart foreign application in WIPO under application No. PCT/US06/36759.

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