In situ deposition of a low κ dielectric layer,...
In situ deposition of a low K dielectric layer, barrier...
In situ hard mask approach for self-aligned contact etch
In situ plasma clean for tungsten etching back
In situ plasma pre-deposition wafer treatment in chemical vapor
In situ plasma pre-deposition wafer treatment in chemical...
In situ reduction of copper oxide prior to silicon carbide...
In situ silicon and titanium nitride deposition
In situ titanium aluminide deposit in high aspect ratio...
In-plane on-chip decoupling capacitors and method for making...
In-situ capped aluminum plug (CAP) process using selective CVD A
In-situ cleaning process for Cu metallization
In-situ co-deposition of Si in diffusion barrier material...
In-situ deposition for Cu hillock suppression
In-situ formation of conductive filling material in...
In-situ N.sub.2 plasma treatment for PE TEOS oxide deposition
In-situ pre-ILD deposition treatment to improve ILD to metal adh
In-situ silicon nitride and silicon based oxide deposition...
Inclusion of low-k dielectric material between bit lines
Incorporating dopants to enhance the dielectric properties...