Interlevel dielectrics with reduced dielectric constant
Intermetal dielectric layer formation with low dielectric consta
Intermittent pulsed oxidation process
Intrinsic dual gate oxide MOSFET using a damascene gate process
Ion implanted microscale and nanoscale device method
Ion-assisted oxidation methods and the resulting structures
Ion-assisted oxidation methods and the resulting structures
Ion-assisted oxidation methods and the resulting structures
Ion-assisted oxidation methods and the resulting structures
Ionic additives for extreme low dielectric constant chemical...
Ionic additives for extreme low dielectric constant chemical...
Isolation chamber arrangement for serial processing of...