Porous silicon oxycarbide integrated circuit insulator
Post deposition plasma treatment to increase tensile stress...
Post deposition plasma treatment to increase tensile stress...
Post deposition treatment of dielectric films for interface...
Post thermal treatment methods of forming high dielectric...
Post thermal treatment methods of forming high dielectric...
Post treatment of low k dielectric films
Post-processing a completed semiconductor device
Post-processing treatment of low dielectric constant material
Precleaning method of precleaning a silicon nitride film...
Precleaning process for metal plug that minimizes damage to...
Precleaning process for metal plug that minimizes damage to...
Precursor compositions and processes for MOCVD of barrier...
Precursor for hafnium oxide layer and method for forming...
Precursor for hafnium oxide layer and method for forming...
Precursor source mixtures
Precursors for film formation
Precursors for zirconium and hafnium oxide thin film deposition
Preparation of composite high-K/standard-K dielectrics for...
Pretreatment method of a silicon wafer using nitric acid