Upside down bake plate to make vertical and negative...
Use of alkylated polyamines in photoresist developers
Use of base developers as immersion lithography fluid
Use of chromeless phase shift features to pattern large area...
Use of cover sheet and interposed flexible film with block copol
Use of DARC and BARC in flash memory processing
Use of desiccant to control edge fusion in dry film photoresist
Use of dual mask processing of different composition such as...
Use of flashed radiant energy in producing relief images in resi
Use of frequency-modulated screening for lightening offset...
Use of graft copolymers for the production of...
Use of highly alkaline developer regenerator composition
Use of metal compounds in imagable articles
Use of methanofullerne derivatives as resist materials and...
Use of mixed bases to enhance patterned resist profiles on...
Use of mixtures of ethyl lactate and N-methyl pyrollidone as an
Use of mixtures of polymethyl methacrylate and styrene-acrylonit
Use of N,N-dialkyl ureas in photoresist developers
Use of particular mixtures of ethyl lactate and methyl ethyl ket
Use of pedestals to fabricate contact openings