Use of mixtures of ethyl lactate and N-methyl pyrollidone as an

Details Use of mixtures of ethyl lactate and N-methyl pyrollidone as an Use of mixtures of ethyl lactate and N-methyl pyrollidone as an

1997-04-03

1998-09-29

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430192, 430325, 430326, 430330, 430331, G03F 738

Patent

active

058144331

ABSTRACT:
The invention provides a process for removing unwanted photoresist material from the periphery of a photoresist-coated substrate using a solvent composition of ethyl lactate and N-methyl pyrollidone, where the amount of N-methyl pyrollidone ranges from about 3% to about 20% by weight of the total composition, and where the solvent composition has a flash point of greater than 100.degree. F. (38.degree. C.), has an odor threshold value greater than 5000, is effective as both a backside and topside edge bead remover and can effectively remove the edge bead from an unbaked or baked photoresist film.

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