Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1988-01-06
1989-12-12
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430165, 430168, 430311, 427240, 427336, B05D 512, B05D 312
Patent
active
048867284
ABSTRACT:
A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:
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patent: 4685975 (1987-08-01), Kottman et al.
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Love, Jr. Marvin L.
Salamy Thomas E.
Towner Mark E.
Chea Thorl
Michl Paul R.
Olin Hunt Specialty Products Inc.
Simons William A.
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