Use of N,N-dialkyl ureas in photoresist developers

Details Use of N,N-dialkyl ureas in photoresist developers Use of N,N-dialkyl ureas in photoresist developers

2000-01-06

2000-09-19

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

510176, G03C 530, G03F 732, C11D 150

Patent

active

061209783

ABSTRACT:
This invention provides water-based photoresist developer/electronics cleaning compositions manifesting reduced equilibrium and dynamic surface tension by the incorporation as surfactant of an effective amount of certain N,N-dialkyl urea compounds of the structure where R and R' are independently C1 to C6 alkyl or cycloalkyl with the sum of the carbon atoms in both R and R' being 6 to 12.

REFERENCES:
patent: 5821036 (1998-10-01), Ficner et al.
patent: 5985968 (1999-11-01), Lassila et al.
Microlithography, Science and Technology edited by James R. Sheats and Bruce w. Smith, Marcel Dekker, Inc. 1998, pp. 551-553.
Maekawa et al., Dissolution Inhibitory Effect of Urea Additives on a Carboxyl Polymer Through a Supramolecular Structure, Journal of Photopolymer Science and Technology, vol. 11, 3 (1998) 533-536.

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