Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2011-06-14
2011-06-14
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S270100, C430S311000, C430S317000, C430S318000, C430S326000, C430S330000, C430S942000
Reexamination Certificate
active
07960095
ABSTRACT:
Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
REFERENCES:
patent: 4814244 (1989-03-01), Koguchi et al.
patent: 4855017 (1989-08-01), Douglas
patent: 4954218 (1990-09-01), Okumura et al.
patent: 5362663 (1994-11-01), Bronner et al.
patent: 5429710 (1995-07-01), Akiba et al.
patent: 5562801 (1996-10-01), Nulty
patent: 5618751 (1997-04-01), Golden et al.
patent: 5712078 (1998-01-01), Huang et al.
patent: 5731131 (1998-03-01), Momma et al.
patent: 5744376 (1998-04-01), Chan et al.
patent: 5801094 (1998-09-01), Yew et al.
patent: 5821469 (1998-10-01), Shanmugham
patent: 5876900 (1999-03-01), Watanabe et al.
patent: 5919597 (1999-07-01), Sinta et al.
patent: 5948570 (1999-09-01), Kornblit et al.
patent: 5985512 (1999-11-01), Hatakeyama et al.
patent: 6037097 (2000-03-01), Bucchignano et al.
patent: 6043003 (2000-03-01), Bucchignano et al.
patent: 2002/0090569 (2002-07-01), Suzuki et al.
patent: 2003/0186161 (2003-10-01), Fujimori
patent: 2003/0194640 (2003-10-01), Sato
patent: 2003/0194650 (2003-10-01), Kanna et al.
patent: 2004/0259028 (2004-12-01), Sato
patent: 2005/0053861 (2005-03-01), Yoneda et al.
patent: 2005/0164123 (2005-07-01), Mizutani
patent: 1254944 (2000-05-01), None
patent: 0628876 (1994-12-01), None
patent: 1319981 (2003-06-01), None
patent: 1338922 (2003-08-01), None
patent: 1489459 (2004-12-01), None
patent: 1557720 (2005-07-01), None
patent: H09325496 (1997-12-01), None
patent: H11-282166 (1999-10-01), None
patent: 2001125272 (2001-05-01), None
patent: 2002511505 (2002-04-01), None
patent: 200343679 (2003-02-01), None
patent: 200355341 (2003-02-01), None
Dean, et al.—Investigation of Deep Ultraviolet Photoresists on TiN Substrates—514/SPIE Proceed, vol. 2438 (1995).
International Search Report dated Nov. 5, 2004.
Angelopoulos Marie
Huang Wu-Song
Medeiros David R.
Moreau Wayne M.
Petrillo Karen E.
Brown Katherine S.
Capella Steven
International Business Machines - Corporation
Lee Sin J.
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