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Integrated post-etch treatment for a dielectric etch process

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Method and compositions for hardening photoresist in etching...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Method for fine patterning of a polymeric film

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Method for forming a micro-pattern on a substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Method of protecting silicon wafers during wet chemical etching

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Methods of etching silicon-oxide-containing compositions

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Methods of reducing photoresist distortion while etching in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Plasma etching using polycarbonate mask and low pressure-high de

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Plasma etching using polycarbonate mask and low-pressure...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Polymer-based micromachining for microfluidic devices

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Shadow mask, a method of forming the shadow mask, and a...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Ultrafine pattern forming method and ultrafine etching method us

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Vapor HF etch process mask and method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Vapor HF etch process mask and method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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