4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask resist contains organic compound
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Method and compositions for hardening photoresist in etching...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Reexamination Certificate

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Method for fine patterning of a polymeric film

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Patent

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Method for forming a micro-pattern on a substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Method of protecting silicon wafers during wet chemical etching

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Patent

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Methods of etching silicon-oxide-containing compositions

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Reexamination Certificate

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Methods of reducing photoresist distortion while etching in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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