Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Patent
1997-08-06
2000-10-24
Gulakowski, Randy
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Mask resist contains organic compound
216 27, 4352872, B44C 122
Patent
active
061362123
ABSTRACT:
The present invention relates to polymer-based micro-electro-mechanical system (MEMS) technology suitable for the fabrication of integrated microfluidic systems, particularly medical and chemical diagnostics system, ink-jet printer head, as well as any devices that requires liquid- or gas-filled cavities for operation. The integrated microfluidic systems may consist of pumps, valves, channels, reservoirs cavities, reaction chambers, mixers, heaters, fluidic interconnects, diffusers, nozzles, and other microfluidic components on top of a regular circuit substrate. This technology is vastly superior than any alternatives available such as glass-based, polysilicon-based MEMS technology as well as hybrid `circuit board` technology because of its simple construction low cost, low temperature processing, and its ability to integrate any electronic circuitry easily along with the fluidic parts.
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Man Piu F.
Mastrangelo Carlos H.
Webster James R.
Gulakowski Randy
Olsen Allan
The Regents of the University of Michigan
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