4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask resist contains organic compound
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Plasma etching using polycarbonate mask and low pressure-high de

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Patent

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Plasma etching using polycarbonate mask and low-pressure...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Reexamination Certificate

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Polymer-based micromachining for microfluidic devices

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Patent

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