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Post clean treatment

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post CMP cleaning method using a brush cleaner with torque...

Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Reexamination Certificate

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Post etch wafer surface cleaning with liquid meniscus

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Reexamination Certificate

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Post etching treatment process for high density oxide etcher

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post etching treatment process for high density oxide etcher

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post etching treatment process for high density oxide etcher

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post etching treatment process for high density oxide etcher

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post polycide gate etching cleaning method

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post treatment method for in-situ cleaning

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent

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Post-chemical mechanical planarization clean-up process using po

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent

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Post-CMP cleaner apparatus and method

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Post-CMP wafer clean process

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent

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Post-CMP wet-HF cleaning station

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Post-etch, printed circuit board cleaning process

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Post-etching alkaline treatment process

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Post-ion implant cleaning for silicon on insulator substrate...

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Post-polish cleaning of oxidized substrates by reverse colloidat

Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Patent

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Post-polishing cleaning of semiconductor surfaces

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Post-polishing semiconductor surface cleaning process

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Post-treatment method for dry etching

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent

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