LandOfFree - US Patents - Listing for Chemistry: electrical and wave energy,Processes and products,Coating, forming or etching by sputtering

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for forming refractory metal nitride film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for forming silicon nitride film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for forming thin film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for forming thin film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for forming thin films

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for forming Ti-tin laminates

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for generating and activating plasma process of treatment

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for grading surface topography for improved step...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for high density edge mounting of chips

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for high scan sputter coating to produce coated,...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for high-precision multi-layered thin film deposition for

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for igniting a plasma in a sputter reactor

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for improved bottom and side wall coverage of high aspect

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for improving conformity and contact bottom coverage of s

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for improving performance of sputtering target

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for improving step coverage of a metallization layer on a

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for improving the performance of high temperature superco

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for in-situ cleaning a Ti target in a Ti + TiN coating pr

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Method for inductively-coupled-plasma-enhanced ionized...