Method for generating and activating plasma process of treatment

Details Method for generating and activating plasma process of treatment Method for generating and activating plasma process of treatment

1994-02-10

1997-05-13

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429838, 427508, 427553, 427575, 118723MW, 118723ME, 216 69, 438729, 438726, 156345, B44C 122, C03C 1500

Patent

active

056288832

ABSTRACT:
A method for generating plasma, comprising irradiating an electromagnetic wave to an energy converter capable of converting an irradiated electromagnetic wave to an electric energy and discharging said electric energy, in the presence of a rare gas in a chamber. A method for activating plasma, further comprising applying an electric cr magnetic field to said generated plasma, a process for treating a substrate, using the generated and optionally activated plasma, and apparatuses therefor are also disclosed.

REFERENCES:
patent: 4138306 (1979-02-01), Nina
patent: 4309295 (1982-01-01), McSweeney
patent: 4405478 (1983-09-01), Murase et al.
patent: 4547314 (1985-10-01), Masuyama et al.
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 4778561 (1988-10-01), Ghanbari
patent: 5013401 (1991-05-01), Samukawa et al.
patent: 5024716 (1991-06-01), Sato
patent: 5126164 (1992-06-01), Okazaki et al.

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