Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-09-09
1995-06-27
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20419225, 20419227, 437190, 437192, C23C 1434, H01L 21203
Patent
active
054276667
ABSTRACT:
A novel method of in-situ cleaning a Ti target in a Ti+TiN anti-reflective coating process when such Ti and TiN deposition process are conducted in the same process chamber by the addition of a simple process step and without the use of a shutter.
REFERENCES:
patent: 4783248 (1988-11-01), Kohlhase et al.
patent: 4900630 (1990-02-01), Suzuki et al.
patent: 5240880 (1993-08-01), Hindman et al.
patent: 5289035 (1994-02-01), Bost et al.
Egermeier John C.
Guo Xin
Mueller Mark A.
Applied Materials Inc.
Breneman R. Bruce
McDonald Rodney G.
Taylor John P.
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