Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-09-14
1996-05-07
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20419215, 2042982, 20429825, C23C 1434
Patent
active
055142575
ABSTRACT:
A method for forming Ti--TiN laminates adapted to reduce the formation of dust particles harmful to semiconductor devices without detriment to productivity, and a magnetron cathode for performing the method are provided. Ti films and TiN films are formed through sputtering of a Ti target using a multi-chamber system comprising at least two chambers each having a magnetron cathode in which a magnet can be moved to accommodate different films. The type of film being formed in each chamber is periodically alternated to prevent a buildup of TiN film adhered to the inner walls of the chambers which peels and causes dust particles.
REFERENCES:
patent: 4592306 (1986-06-01), Gallego
patent: 4753851 (1988-06-01), Roberts et al.
patent: 4783248 (1989-11-01), Kohlhase et al.
patent: 5120417 (1992-06-01), Takahashi et al.
patent: 5282947 (1994-02-01), Brugge et al.
patent: 5288379 (1994-02-01), Namiki et al.
Kobayashi Masahiko
Takahashi Nobuyoki
Anelva Corporation
Nguyen Nam
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