Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1999-01-05
2000-05-09
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
438758, 438106, 427455, 427576, 427584, 427585, 427250, 427437, C23C 1434, C23C 1600, C23C 408, B05D 118, H01L 2131
Patent
active
060599391
ABSTRACT:
An integrated circuit package derives increased mechanical robustness and electrical reliability consistent with increased heat dissipation capacity by edge bonding of integrated circuit chips onto a substrate such as a chip, board, module or another integrated circuit by forming a solder or conductive adhesive bond between a bonding/contact pad on the substrate and a metallization feature extending at least on limited opposing areas of major surfaces of the chip and, preferably, across the edge of the chip. Thermally conducting material contained in a cap may provide additional, distributed support for the chip by a combination of viscosity and density providing buoyancy of the chips. Alternatively, a cap may be provided which further stabilizes the edge-mounting of chips while increasing velocity of cooling fluid against the chips. Novel techniques of forming a metallization feature across the edge of a chip with high efficiency and manufacturing yield includes enclosure of chips or strips of chips in a tool including a grooved mask or enclosing the chips or strips of chips in a resist which may be exposed and developed using at least a portion of the same tool.
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Pierson Mark Vincent
Youngs, Jr. Thurston Bryce
Cantelmo Gregg
Fraley Lawrence R.
International Business Machines - Corporation
Nguyen Nam
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