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Method for etch rate enhancement by background oxygen control in

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for evaluating a lithium niobate thin film and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating a magnetic recording medium

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating a magneto-optical recording element

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating a semiconductor device in a magnetron...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating beryllium-based multilayer structures

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating dual layer protective barrier copper meta

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating electrode for rechargeable lithium...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating fresnel lenses by selective application a

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating interconnection structure

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating multi-layer optical films

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating optical information storage medium

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating semiconductor device

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating transparent conductive ITO film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabricating ZnO thin film for ultraviolet...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabrication of metallized medical devices

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for fabrication of thin-film bolometric material

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for formation of protective coatings with...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for forming a metallization structure in an...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for forming a perovskite thin film using a sputtering...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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