Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-11-03
1991-01-29
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
437192, 437194, 437241, C23C 1434, H01L 21285
Patent
active
049884239
ABSTRACT:
Disclosed is a method for fabricating an interconnection structure comprising a step of depositing an Al or Al alloy film on a dielectric film by a sputtering method improved in step coverage, a step of processing said Al or Al alloy film or a layered metal film thereof with another metal film into a metal line, and a step of depositing a film of high melting point metal or alloy thereof on the top and side surfaces of said line.
REFERENCES:
patent: 4517225 (1985-05-01), Broadbent
patent: 4824803 (1989-04-01), Us et al.
D. S. Gardner et al., IEEE Transaction on Electron Devices, vol. 32, (1985) pp. 174-181.
H. P. W. Hey et al., Technical Digest of 1986 International Electron Device Meeting, pp. 50-52.
K. Kamoshida et al., Technical Digest of 1986 International Electron Device Meeting, pp. 70-73.
Yamamoto et al., IEEE International Electron Devices Meeting, Dec. 6-9, 1987, pp. 205-208.
Fujii Shinji
Fujita Tsutomu
Kakiuchi Takao
Tanimura Shuichi
Yamamoto Hiroshi
Matsushita Electric - Industrial Co., Ltd.
Weisstuch Aaron
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