Method for evaluating a lithium niobate thin film and apparatus

Details Method for evaluating a lithium niobate thin film and apparatus Method for evaluating a lithium niobate thin film and apparatus

1991-04-25

1992-07-07

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20419218, 20419231, 20429803, 20429805, C23C 1434

Patent

active

051280078

ABSTRACT:
A method for evaluating a lithium niobate thin film includes measuring an absorption edge wavelength of a lithium niobate thin film and evaluating a lithium-to-niobium composition ratio of the thin film, and an apparatus for preparing a thin film including a thin film-forming body capable of controlling the lithium-to-niobium composition ratio of a lithium niobate thin film being formed and an evaluation device for evaluating the lithium-to-niobium composition ratio, the evaluation device being provided with a monitor substrate, an optical path for spectrometry, an ultraviolet ray source and a measurement part for measuring an absorption edge wavelength of the thin film.

REFERENCES:
patent: 3734620 (1973-05-01), Cade
patent: 3988232 (1976-10-01), Wasa et al.
patent: 4140078 (1979-02-01), Wilmanns
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4172020 (1979-10-01), Tisone et al.
patent: 4311725 (1982-01-01), Holland
patent: 4407709 (1983-10-01), Enjouji et al.

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