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Substrate holding system and exposure apparatus having the same

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Substrate material for X-ray optical components

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Synchrotron radiation apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Synchrotron radiation measurement apparatus, X-ray exposure...

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Synchrotron radiation measurement apparatus, X-ray exposure...

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Synchrotron radiation utilizing apparatus and method for utilizi

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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System for magnification correction of conductive X-ray lithogra

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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System for transferring a fine pattern onto a target

X-ray or gamma ray systems or devices – Specific application – Lithography
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