Synchrotron radiation measurement apparatus, X-ray exposure...

Details Synchrotron radiation measurement apparatus, X-ray exposure... Synchrotron radiation measurement apparatus, X-ray exposure...

2005-01-25

2005-01-25

Bruce, David V. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S019000, C378S145000

Reexamination Certificate

active

06847696

ABSTRACT:
A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.

REFERENCES:
patent: 4734685 (1988-03-01), Watanabe
patent: 5204887 (1993-04-01), Hayashida et al.
patent: 5285488 (1994-02-01), Watanabe et al.
patent: 5444758 (1995-08-01), Miyake et al.
patent: 5448612 (1995-09-01), Kasumi et al.
patent: 5835560 (1998-11-01), Amemiya et al.
patent: 5930324 (1999-07-01), Matsui et al.
patent: 6081581 (2000-06-01), Hasegawa
patent: 6160865 (2000-12-01), Ogushi
patent: 6385497 (2002-05-01), Ogushi et al.

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