X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1991-05-30
1992-07-28
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378161, G21K 500
Patent
active
051346400
ABSTRACT:
An X-ray radiation apparatus comprises a synchrotron 11 that generates X rays, an X-ray reflecting mirror 13 that reflects X rays emitted from the synchrotron 11, a mirror driving mechanism that enlarges the X-ray illumination area by oscillating the mirror 13, a beryllium window 14 that is connected to the synchrotron-side housing base containing the mirror 13 by means of a bellows 17 and that allows the X rays reflected by the mirror 13 to be taken out of the vacuum environment, and a window driving mechanism 18 that moves the window 14 along with the movement of the X-ray illumination position by oscillating the window 14 in synchronization with the oscillation of the mirror 13. With this arrangement, the X rays coming from the window 14 pass through the X-ray mask 15 and fall upon the specimen 16 to replicate the mask pattern into the specimen.
REFERENCES:
patent: 4748646 (1988-05-01), Osada et al.
J. Vac. Sci. Technol. B1 (4), Oct.-Dec. 1983, "Design and Performance of an X-ray Lithography Beam Line at a Storage Ring", R. P. Haelbich et al.
Hirokawa Toshio
Kikuiri Nobutaka
Kuwabara Osamu
Uchida Norio
Church Craig E.
Kabushiki Kaisha Toshiba
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